王涛-EULITHA_CIOE Chengdu_share version.pdf

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1、 Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-高分辨曝光系统PhableR&PhableX&PhableSDisplacement Talbot LithographyTao Wang（王涛）Tel:13810458275E-Mail:zola.wangeulitha-2024/4/25 Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-2CompanyEulitha AG公司成立于2006年。

2、瑞士保罗谢尔研究所团队高分辨光刻机供应商全球用户和技术支持瑞士总部中国、美国办公室EulithaAGPaul Scherrer Institute Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-3Lithography tool for Photonics曝光技术：位移泰伯光刻 Displacement Talbot Lithography(DTL)纳米周期性图形，光电领域相关应用高产量、低成本纳米图形光刻方案采用标准光刻工艺制程Photonics structures prepared by

3、 DTL technology Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-MaskResistWaferpDisplacement Talbot LithographyH.Solak,C.Dais,F.Clube,Optics Express,Vol.19,No.11(2011)DTL benefits非接触曝光无景深限制高分辨率(100nm)大面积均匀性高效率纳米图形化Static Talbot carpetDTL integral processResist pattern after

4、 DTL22pDisplacementpp/2Mask Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-51D Pattern Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-High-Depth of Focus(DOF)05010015000.511.5Linewidth(nm)Gap(mm)PS3231116bGap=100 um750um1,250 um1,500 umLine perio

5、d=300 nm Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-7Patterning on Curved surface DTL曝光技术可以在曲面上进行曝光 Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-82D Pattern Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-9Circular

6、(curved)Gratings Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-10Variable Duty-Cycle PrintingDuty cycle 25%-75%Eulitha Beijing Co,Ltd|ConfidentialInformation|4/25/2024|zola.wangeulitha-11Variable Duty-Cycle Printing2D variable DC map光栅渐变的占空比（DC）结构，用于调节衍射效率1D和2D 图案在平面内，自定义