思锐智能-CIOE2024.pdf

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1、Ultra-fast,high-quality and conformal production of optical coatings with spatial atomic layer depositionD.Sc.John R nn Senior ScientistBeneq Advanced ALD Business UnitCIOE 2024,September 12th,202409/24/202424.9.2024Beneq is the Home of ALDEL display manufacturing starts as the first industrial ALD

2、application1984Invention of ALD in Finland1974Beneq acquires the original ALD IP and team2007Beneq acquires the EL display business201209/24/2024Introduction of SRII青岛四方思锐智能技术公司介绍24.9.2024Acquisition of Beneq Finland.Full-scale launch of ALD business.Driving business toward more Markets such as semi

3、conductors,optics etc.全资收购Beneq。全面优化升级ALD业务。进一步开拓半导体，光学，零部件镀膜等市场。Overseas Ion Implantation Technology Cooperation.Build IMP R&D team in China.Development of ALD and IMP business lines in China.在中国建立离子注入研发团队。国内发展ALD和IMP 双业务。2018201820212021青岛四方思锐智能技术有限公司Global Business Layout24.9.2024Beneq OyEspoo,Fi

4、nlandQingdao定位：行政总部业务覆盖：中国大陆及台湾、日本、新加坡等亚洲市场Boulder,USAYokohama,JapanBeijing定位：国内研发中心Sales&servicesGlobal R&D,manufacture centerHeadquartersManufacture centerSales,Marketing CenterR&D CenterSales&servicesSales&servicesShanghaiTaiwan09/24/2024Optical Coatings Motivation Beneq Confidential09/24/2024PVD

5、 vs.ALDBeneq ConfidentialLow TemperatureHigh Deposition RateLow ConformalityPVDALDSource controlled gas-phase processSurface controlled gas-phase processLow TemperatureHigh ConformalityLow Deposition RateLow TemperatureHigh ConformalityLow Deposition RateHigh Deposition RateOptical element geometryP

6、erformance09/24/2024Spatial Atomic Layer Deposition09/24/2024Traditional ALD vs.Spatial ALD Traditional(temporal)ALD Precursors present in the same space but separated in time Growth rate is limited by precursor pulsing/purging time Process time greatly increases at lower temperatures/high volumesTy