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DC25_PAPER_Track10_InSituSystemLevelPDN_Bogatin.pdf

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1、 1|P a g e In situ System Level PDN Impedance Measurements.Adinath Phene,University of Colorado,Boulder Adinathgirish.phenecolorado.edu Eric Bogatin,University of Colorado,Boulder Eric.bogatincolorado.edu Rylee Beech,BAE Systems rylee.beachcolorado.edu Melinda Piket-May,University of Colorado,Boulde

2、r melinda.piket-maycolorado.edu 2|P a g e Abstract Designing a power distribution network from the die to the VRM is increasingly important in all electronic systems as noise margins decrease,current draws increase and switching times decrease,all driven by lower cost.The importance of this problem

3、has stimulated advances in refining best system-level design practices,simulation tools that enable exploring virtual prototypes of PDN systems,and measurement methods to measure ultra-low impedance PDN elements below 1 mOhm impedances at GHz frequencies.Most of the measurement methods implemented h

4、ave focused on component characterization or board-level PDN measurements.What is really important is being able to measure and validate the PDN impedance profile of the PDN system,from the die,looking outward all the way to the VRM,while the chip is powered on.The methods reported to perform in sit

5、u PDN measurements use either special test chips or expensive probe stations that are difficult to use with large or complex boards.This paper introduces a simple method to measure the system-level PDN impedance profile from the dies perspective,including the on-die capacitance all the way to the VR

6、M.It is suitable for sub-milliOhm impedances and in the GHz frequency range in a powered or unpowered state.This technique leverages the commonly used 2-port shunt VNA method,applied to using two independent package-lead connections to the chip.Three special features enable this method to be applied

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1. **方法创新**:提出一种通过GPIO引脚实现芯片级PDN阻抗原位测量的方法,无需特殊测试芯片或昂贵探针台,适用于亚毫欧级、GHz频段。 2. **关键技术**: - 使用UFL连接器连接VCC引脚与VNA,通过DC阻断电容处理5V偏压。 - 采用新型去嵌入技术消除同轴电缆相位影响(如0.438 ns时延补偿)。 3. **核心数据**: - 测得Atmega 328 PDN七区域模型参数,如片上电容1.5 nF(带电时)、封装引脚电感1 nH。 - 不同去耦电容布局导致ESL差异:最佳实践(0.12 nH)vs 病理设计(8.5 nH)。 4. **验证与意义**: - 模型与测量阻抗匹配(图11、15),证明芯片视角PDN阻抗显著高于板级(图18)。 - 揭示电压降额效应:电容带电时容量下降(如10 uF→1.85 uF)。
**PDN如何测量?** **阻抗峰值影响?** **电容值优化?**
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