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DC25_PAPER_Track04_TheInfluenceofCopperCrystal_shen_V2.pdf

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1、 Information Classification:General The Influence of Copper Crystal Structure on Signal Integrity Chuansheng Cheng Bytedance Changdong Gu Zhejiang Huanergy Dayong Shen Bytedance Hui Luo Zhejiang Huanergy Lei Ding Zhejiang Huanergy Anbing Sun Ruijie networks Tony Liu Nan Ya New Materials tony.liuccl-

2、 Wenqiang Zhang Nan Ya New Materials zhangwqccl- Information Classification:General Abstract:The signal integrity of the conductor for high frequency and high-speed digital applications requires copper foils with lower profiles and without magnetic elements.In fact,copper foils must undergo several

3、manufacturing processes to the end products,for example,the lamination process and the various PCB manufacturing steps.As well as the copper foil profile and surface chemistry,some manufacturing processes,such as laminate etching,low profile browning process,etc.,may also influence the signal integr

4、ity performances of the end product.Particularly,the crystallographic orientations and grain boundaries of the copper foils would play important roles in manipulating surface morphologies in PCB etching,which further influences the signal integrity of the conductor in HDIs.However,there is few repor

5、ts on this issue.Herein,low profile copper foils with tunable crystallographic structures and surface morphologies were fabricated by the copper foil manufacturing industry and receieved the same and routine manufacturing processes in CCL and PCB sections.Thus,the impact of the microstructures of co

6、pper foil on the signal integrity was finally obtained by experimental investigations.Our findings would bring a novel contribution from the perspective of copper foils to get lower electrical losses in high-speed digital applications.Authors Biography Dayong Shen is a high-speed signal system engin

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1. **研究目的**:探究铜箔晶体结构(晶粒取向、尺寸)对高速信号完整性的影响,尤其在高频(224G)下导体损耗(αC)的控制。 2. **关键发现**: - 退火处理使铜箔晶粒细化(RTF2平均晶粒尺寸从1.0μm降至0.8μm,HVLP2从1.0μm微增至1.0μm),但表面粗糙度(Rz≈1.9μm,Sdr≈11%)无显著变化。 - 插入损耗测试显示,20GHz以下晶粒结构影响可忽略;20-50GHz时,HVLP2损耗波动<2%,RTF2损耗高于HVLP2但退火前后差异小。 3. **结论**:铜箔晶体结构对信号完整性影响有限,未来需研究更高频段(50-100GHz)及晶粒细化工艺。
**铜晶粒如何影响信号?** **高频损耗如何降低?** **铜箔粗糙度有何作用?**
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