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UV和DUV光刻机数值孔径◆
UV和DUV光刻机数值孔径◆
行业数据
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所属报告：
海外半导体设备巨头巡礼系列：详解光刻巨人ASML成功之奥妙-241015（94页）.pdf
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图表14介质折射率及光线入射角度决定数值孔径
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行业数据
2025-10-16
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蔡司最畅销的几款DUV（深紫外线）、NUV（近紫外线）物镜系统
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行业数据
2025-06-12
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采用浸没式DUV与EUV的工艺步数对比
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行业数据
2024-12-09
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光刻机的结构构成（以浸没式DUV设备TWINSCANNET：2100i为例）
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行业数据
2024-12-09
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DUV光刻机投影物镜示意图（折射式）◆
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行业数据
2024-10-16
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DUV光刻主要用于28nm及以上成熟制程
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行业数据
2024-10-11
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ASML各型号DUV收入（百万欧元）
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行业数据
2024-10-11
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图23DUV光源产生原理以及光谱分布
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行业数据
2024-09-14
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图12.深紫外（DUV）光刻术
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其它
2023-12-05
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公司EUV与DUV光刻机产能规划
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行业数据
2023-06-16
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DUV1980主要用于成熟制程，多重曝光可以实现14-10nm制程生产
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行业数据
2023-04-14
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DUV光刻胶中国大陆需求（吨）
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行业数据
2022-05-20
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DUV光刻胶原材料体系变化
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行业数据
2022-05-20
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最新数据
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全球拥有AKK专利菌株的核心企业
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2026-07-30
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，ASML正考虑在EUV光源的波长条件下，增大物镜的数值孔径NA。目前ASML已经量产的NXE系列EUV光刻机的NA为0.33，0.55 NA的高数值孔径（High-NA）EUV光刻机也已成功研发并出货，ASML计划于2025-2026年量产High-NA EUV光刻机，并开始研发新一代0.75 NA的Hyper-NA EUV光刻机（预计2030年推出）。
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当前图表所属：
海外半导体设备巨头巡礼系列：详解光刻巨人ASML成功之奥妙-241015（94页）.pdf
2026年半导体光刻机行业报告：ASML垄断格局，国产光刻机自主化进程
相比DUV光刻机，EUV光刻机在光源、大气条件、光学元件方面提出◆
扫描式—单个曝光场“扫描拍照”，步进重复式—多个曝光场“一步步拍照”，步进扫描式—多个曝光场
多重曝光可显著增强光刻机的分辨率◆
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